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  • LOG3Mask featured in Nature publication
    January 11, 2022

    LOG3Mask featured in Nature publication

    Congratulations to the Claros team on their recent publication in the journal Nature. The LOG3Mask and its antiviral capabilities is featured front and center.

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  • LOG3Mask recognized with IFAI International Achievement Award
    December 6, 2021

    LOG3Mask recognized with IFAI International Achievement Award

    The LOG3Mask receives an International Achievement Award for "Protective & Functional Apparel" from the Industrial Fabrics Association International (IFAI). IFAI is a not-for-profit trade association representing the global industrial fabrics industry. Learn more about IFAI and this award.  

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  • Mask Design Innovation
    June 18, 2021

    Mask Design Innovation

    The LOG3Mask, featuring ZioShield technology, was selected as a top-40 finalist in a national competition to develop innovative mask technology. The competition is presented by BARDA DRIVe, in partnership with the National Institute for Occupational Safety and Health (NIOSH). The...

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  • Safe For You & the Environment
    May 17, 2021

    Safe For You & the Environment

    Certified by an independent dermatology laboratory, the ZioShield enabled LOG3Mask is non-irritant and hypoallergenic. The mask uses eco-friendly materials and ingredients, recognized as safe by the FDA. Fabrics treated with ZioShield technology have been demonstrated to maintain their antimicrobial activity...

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  • CDC Support Announced
    May 17, 2021

    CDC Support Announced

    The US Centers for Disease Control and Prevention (CDC) has just contracted Claros Technologies, the team behind the LOG3Mask, to scale up the production of the LOG3Mask and apply the ZioShield technology to other PPE. Further evidence that science based...

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